LAPTEV, M. V.; KHUDOROZHKOVA, A. O.; ISAKOV, A.; GRISHENKOVA, O. V.; ZHUK, S. I.; ZAIKOV, Y. P. Electrodeposition of aluminum-doped thin silicon films from a KF–KCl–KI–K2SiF6–AlF3 melt: Scientific paper. Journal of the Serbian Chemical Society, Belgrade, Serbia, v. 86, n. 11, p. 1075–1087, 2021. DOI: 10.2298/JSC200917065L. Disponível em: https://shd-pub.org.rs/index.php/JSCS/article/view/9907. Acesso em: 28 mar. 2024.