Laptev MV, Khudorozhkova AO, Isakov A, Grishenkova OV, Zhuk SI, Zaikov YP. Electrodeposition of aluminum-doped thin silicon films from a KF–KCl–KI–K2SiF6–AlF3 melt: Scientific paper. J. Serb. Chem. Soc. [Internet]. 2021 Nov. 22 [cited 2024 Apr. 23];86(11):1075-87. Available from: https://shd-pub.org.rs/index.php/JSCS/article/view/9907