Silicon electrodeposition from chloride–fluoride melts containing K2SiF6 and SiO2

Sergey I. Zhuk, Vladimir A. Isaev, Olga V. Grishenkova, Andrey V. Isakov, Alexey P. Apisarov, Yurii P. Zaikov

Abstract


Silicon electrodeposition on glassy carbon from KF–KCl–K2SiF6, KF–KCl–K2SiF6–KOH and KF–KCl–K2SiF6–SiO2 melts was studied by cyclic voltammetry. The electroreduction of Si(IV) to metallic Si was observed as a single 4-electron wave under all the considered conditions. The reactions of cathode reduction of silicon from fluoride and oxyfluoride complexes were suggested. It was shown that the process could be controlled by the preliminary transformation of SiO44- to SiF62- and SiOxFyz-. The influence of the current density on the structure and morphology of silicon deposits obtained during galvanostatic electrolysis of the KF–KCl–K2SiF6–SiO2 melt was studied.


Keywords


silicon; electrocrystallization; molten salts; cyclic voltammetry

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DOI: https://doi.org/10.2298/JSC160712109Z

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