Mechanical characterization of copper coatings electrodeposited onto different substrates with and without ultrasound assistance
Main Article Content
Abstract
The mechanical properties of systems consisting of copper coatings electrodeposited on both brass sheet (BS) and thick electrodeposited nickel coating (ED Ni) substrates have been investigated. The electrodeposition of copper coatings was performed with and without the ultrasound assistance. The ultrasound application decreases root mean square (RMS) roughness of deposited Cu coating on both applied substrates, as obtained from non-contact AFM measurement. The coating roughness is highly dependent on the substrate roughness, being the smallest for the Cu coatings deposited on ED Ni substrate with the ultrasound mixing. The hardness and adhesion properties were characterized using the Vickers microindentation test. Model of Korsunsky was applied to the experimental data for determination the film hardness and the model of Chen-Gao was used for the adhesion evaluation. The introduction of ultrasonic agitation caused the changes in the film microstructure, and consequently in the mechanical properties. The copper coatings on both substrates, have higher hardness when deposited from electrolyte with ultrasound agitation. Although the type of the substrate has the major influence on the adhesion strength, it can be said that Cu electrodeposition with ultrasonic mixing contributes to an increase in adhesion.
Downloads
Metrics
Article Details
Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution license 4.0 that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
References
W. H. Teh, L. T. Koh, S. M. Chen, J. Hie, C. Y. Li, P. D. Foo, Microelectron. J. 32 (2001) 579 (https://doi.org/10.1016/S0026-2692(01)00035-0)
A. Maciossek, B. Lochel, H. J. Quenzer, B. Wagner, S. Schulze, J. Noetzel, Microelectron. Eng. 27 (1995) 503 (https://doi.org/10.1016/0167-9317(94)00154-M)
F. Wang, P. Zeng, Y. Wang, X. Ren, H. Xiao,W. Zhu, Microelectron. Eng. 180 (2017) 30 (http://dx.doi.org/10.1016/j.mee.2017.05.052)
W. P. Dow, M. Y. Yen, C. W. Liu, C. C. Huang, Electrochim. Acta 53 (2008) 3610 (https://doi.org/10.1016/j.electacta.2007.12.048)
K. Kondo, N. Yamakawa, Z. Tanaka, K. Hayashi, J. Electroanal.Chem. 559 (2003) 137 (https://doi.org/10.1016/S0022-0728(03)00110-4)
J. Lamovec, V. Jović, I. Mladenović, M. Sarajlić, V. Radojević, in Proc. 57th ETRAN Conference, 3–6 June, 2013, Zlatibor, Serbia, pp. MO3.3
L. Bonou, M. Eyraud, Y. Massiani, Electrochim. Acta 47 (2002) 4139 (https://doi.org/10.1016/S0013-4686(02)00356-0)
M. Datta, D. Landolt, Electrochim. Acta 45 (2000) 2535 (https://doi.org/10.1016/S0013-4686(00)00350-9)
C. T. Walker, R. Walker, Electrodepos. Surface Treat. 1 (1973) 457 (https://doi.org/10.1016/0300-9416(73)90029-1)
R. Cui, Y. He, Z. Yu, W. Shu, J. Du, in Proc. of 11th International Conference on Electronic Packaging Technology & High Density Packaging, 16-19.8, 2010, China, p.847
A. M. Korsunsky, M. R. McGurk, S. J. Bull, T. F. Page, Surface Coat. Technol. 99 (1998) 171 (https://doi.org/10.1016/S0257-8972(97)00522-7)
M. Chen, J. Gao, Modern Phys. Lett., B 14 (2000) 103 (https://doi.org/10.1142/S0217984900000161)
J. L. He, W. Z. Li, H. D. Li, Appl. Phys. Lett. 69 (1998) 1402 (https://doi.org/10.1063/1.117595)
H. Qingrun, J. Gao, Modern Phys. Lett., B 11 (1997) 757 (https://doi.org/10.1142/S0217984997000931)
L. Magagnin, R. Maboudian, C. Carraro, Thin Solid Films 434 (2003) 100 (https://doi.org/10.1016/S0040-6090(03)00469-3)
Q. R. Hou, J. Gao, S. J. Li, Eur. Phys. J., B – Cond. Matter Complex Sys. 8 (1999) 493 (https://doi.org/10.1007/S100510050716)
H. Li, R. C. Bradt, J. Mater. Sci. 28 (1993) 917 (https://doi.org/10.1007/BF00400874)
N. D. Nikolić, Z. Rakočević, K. I. Popov, J. Electroanal. Chem. 514 (2001) 56 (https://doi.org/10.1016/S0022-0728(01)00626-X)
N. D. Nikolić, Z. Rakočević, K. I. Popov, J. Solid State Electrochem. 8 (2004) 526, (https://doi.org/10.1007/s10008-003-0467-8)
J. Lamovec, V. Jović, D. Randjelovic, R. Aleksic, V. Radojevic, Thin Solid Films 516 (2008) 8646 (http://dx.doi.org/10.1016/j.tsf.2008.06.035).